发明名称 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor |
摘要 |
An apparatus configured to confine a plasma within a processing region in a plasma processing chamber. In one embodiment, the apparatus includes a ring that has a baffle having a plurality of slots and a plurality of fingers. Each slot is configured to have a width less than the thickness of a plasma sheath contained in the processing region.
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申请公布号 |
US7585384(B2) |
申请公布日期 |
2009.09.08 |
申请号 |
US20080201156 |
申请日期 |
2008.08.29 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
BERA KALLOL;YE YAN;CARDUCCI JAMES D.;HOFFMAN DANIEL J.;SHANNON STEVEN C.;BUCHBERGER, JR. DOUGLAS A. |
分类号 |
H01L21/3065;C23C16/00;H01J37/32;H01L21/306 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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