发明名称 |
METHOD OF FABRICATING A SUSPENDED MICROSTRUCTURE WITH A SLOPED SUPPORT, AND A SUSPENDED MICROSTRUCTURE FABRICATED BY THE METHOD |
摘要 |
The method of fabricating a suspended microstructure with a sloped support, comprises the steps of (a) providing a member having three stacked up layers including a first substrate layer, a second temporary layer and a third photoresist layer; (b) photolithographically transferring a sloped pattern to the third photoresist layer by means of a grey scale mask; (c) etching the second layer through the third layer resulting from step (b) to obtain a surface with at least one continuous slope with a predetermined angle with respect to the first surface layer; (d) depositing a fourth layer on the previous layers; (e) etching the fourth layer to obtain the sloped support; and (f) removing the second layer to obtain the microstructure with the sloped support. The invention is also concerned with a suspended microstructure fabricated by the method.
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申请公布号 |
CA2351132(C) |
申请公布日期 |
2009.09.08 |
申请号 |
CA20012351132 |
申请日期 |
2001.06.21 |
申请人 |
INSTITUT NATIONAL D'OPTIQUE |
发明人 |
JEROMINEK, HUBERT |
分类号 |
B81C1/00;B81B1/00;B81B3/00 |
主分类号 |
B81C1/00 |
代理机构 |
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主权项 |
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