发明名称 Thin film transistor having oxide semiconductor layer and manufacturing method thereof
摘要 A thin film transistor has a semiconductor thin film including zinc oxide, a protection film formed on entirely the upper surface of the semiconductor thin film, a gate insulating film formed on the protection film, a gate electrode formed on the gate insulating film above the semiconductor thin film, and a source electrode and drain electrode formed under the semiconductor thin film so as to be electrically connected to the semiconductor thin film.
申请公布号 US7585698(B2) 申请公布日期 2009.09.08
申请号 US20080190102 申请日期 2008.08.12
申请人 CASIO COMPUTER CO., LTD. 发明人 ISHII HIROMITSU
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
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