发明名称 OPTICAL ELEMENT, EXPOSURE UNIT UTILIZING THE SAME AND PROCESS FOR DEVICE PRODUCTION
摘要 <p>An optical element according to an embodiment comprises a substratum for support; multilayer film (30) capable of reflecting extreme ultraviolet rays, supported by the substratum; and alloy layer (20) interposed between the multilayer film and the substratum, wherein the alloy layer (20) is a thin film of alloy. The alloy layer (20) has a tensile internal stress, reducing the compressive internal stress of the multilayer film (30). Consequently, any deformation of optical element (100) can be inhibited, thereby realizing desirable optical characteristics. Further, on the alloy layer (20), the surface roughness can be minimized. Accordingly, in the forming of the multilayer film (30) on the alloy layer (20), any disordering of the structure of the multilayer film (30) can be suppressed and any deterioration of optical characteristics can be prevented. Thus, the resolving power of exposure unit (400) can be maintained. Further, the life duration of optical element (100) eventually exposure unit (400) can be prolonged.</p>
申请公布号 KR20090094322(A) 申请公布日期 2009.09.04
申请号 KR20097013286 申请日期 2007.10.12
申请人 NIKON CORPORATION 发明人 SHIRAISHI MASAYUKI;MURAKAMI KATSUHIKO
分类号 H01L21/027 主分类号 H01L21/027
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