发明名称 METHOD AND APPARATUS FOR PROCESSING A SUBSTRATE USING PLASMA
摘要 <p>Methods and arrangements for controlling the electron loss to the upper electrode, including techniques and apparatus for biasing the upper electrode more negatively to allow charged species to be trapped within the plasma chamber for a longer period of time, thereby increasing the plasma density. The induced RF signal on the upper electrode is rectified, thus biasing the upper electrode more negatively. The rectified RF signal may also be amplified, thus driving the upper electrode even more negatively, if desired.</p>
申请公布号 KR20090094352(A) 申请公布日期 2009.09.04
申请号 KR20097013625 申请日期 2007.12.14
申请人 LAM RESEARCH CORPORATION 发明人 DHINDSA RAJINDER;ERIC HUDSON;MARAKHTANOV ALEXEI;FISCHER ANDREAS
分类号 H01L21/3065 主分类号 H01L21/3065
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