Exposure apparatus, image forming apparatus and heat adjustment method

摘要

The exposure apparatus is provided with: plural light emitting elements that are arranged in a line; a substrate that the plural light emitting elements are arranged thereon; plural temperature measuring units that are arranged along the arrangement direction of the plural light emitting elements and measure temperatures of the substrate on which the plural light emitting elements are arranged; and plural heating units that are arranged along the arrangement direction of the plural light emitting elements and heat the substrate on the basis of the temperatures measured by the temperature measuring units respectively.