SUBSTRATE STAGE AND PLASMA PROCESSING APPARATUS,申请号KR20070104008-传众专利搜索

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发明名称	SUBSTRATE STAGE AND PLASMA PROCESSING APPARATUS
摘要
申请公布号	KR100914589(B1)	申请公布日期	2009.08.31
申请号	KR20070104008	申请日期	2007.10.16
申请人		发明人
分类号	H01L21/02;H01L21/00;H01L21/3065	主分类号	H01L21/02
代理机构		代理人
主权项
地址

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