发明名称 MASKLESS EXPOSURE APPARATUS USING A PLURALITY OF SPATIAL LIGHT MODULTOR AND METHOD FOR FORMING PATTERN USING THE SAME
摘要 <p>A maskless exposure apparatus using a plurality of spatial light modulator and a method for forming a pattern using the same are provided to rapidly project the pattern by successively projecting the patterns on a plurality of spatial light modulators. A location information provider(250) outputs the input signal which has the predetermined cycle according to the movement of the substrate settled in the stage A drive pulse generating unit(260) produces a plurality of drive pulse signals having the different phase difference in the predetermined cycle using the input signal. At least two spatial light modulators(231,232) successively deliver the light which is income from the light source to the substrate. The location information provider outputs the input signal which shows the location of substrate as the substrate(241) settled in the stage(240) moves. A plurality of drive pulse signals in which the phase difference is generated in one cycle is produced using the input signal.</p>
申请公布号 KR20090091454(A) 申请公布日期 2009.08.28
申请号 KR20080016722 申请日期 2008.02.25
申请人 LG ELECTRONICS INC. 发明人 SHIN, YOUNG HOON;KIM, MYUNG KWAN
分类号 H01L21/027 主分类号 H01L21/027
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