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发明名称
The method for fabricating pattern in semiconductor device
摘要
申请公布号
KR100914295(B1)
申请公布日期
2009.08.27
申请号
KR20070139238
申请日期
2007.12.27
申请人
发明人
分类号
H01L21/027
主分类号
H01L21/027
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代理人
主权项
地址
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