| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask for on chip color filters capable of assuring aperture (pixel) regions of second color (for example, blue) filters and third color (for example, red) filters in desirable shapes and sufficient sizes, when manufacturing a color filter compatible with a photoelectric conversion element of a solid-state image sensor by means of a photolithographic method, and to provide a method of manufacturing the on chip color filters using the same. <P>SOLUTION: The green filters are produced by using the photomask for on chip color filters provided with correction parts 32 at coupling sections at four corners of patterns 33 for forming the first color (for example, green) filters arranged in the form of checker patterns. <P>COPYRIGHT: (C)2009,JPO&INPIT |
