发明名称 APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing semiconductor devices which is sufficiently safe for workers. SOLUTION: The apparatus 100 for manufacturing the semiconductor devices includes: a cabinet 10 having an opening 12 on a front face thereof; a front door 20 provided at the opening 12 of the cabinet 10 so as to be freely openable and closable; a low oxygen gas intake port 14 for introducing nitrogen gas or gas with an oxygen concentration lower than that contained in the atmospheric air into the cabinet 10; a gas exhaust port 16 for exhausting the gas inside the cabinet 10; a ventilation mechanism 30 for introducing atmospheric air or oxygen into the cabinet 10; a locking mechanism 40 for locking the front door 20 in a closed state; and a detector 50 for detecting the oxygen concentration in the cabinet 10, wherein the locking mechanism 40 unlocks the front door when the oxygen concentration detected by the detector 50 reaches a predetermined value or higher. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009194358(A) 申请公布日期 2009.08.27
申请号 JP20080194491 申请日期 2008.07.29
申请人 SEIKO EPSON CORP 发明人 MIURA MASAO
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
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