发明名称 APPARATUS FOR TREATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide an apparatus in which a coating layer to a substrate has stability satisfactory over a long period of time, and in addition, the characteristics such as sheet resistance and sheet uniformity, are improved. SOLUTION: In the vacuum chamber 2, there are arranged n cathodes 7-10 and n+1 anodes 28-32, each of the anodes adjacent to a cathode 7-10. Each of the n cathodes 7-10 and n of the assigned anodes 29-32 are connected to a power supply 11-14. One of the anodes 28 not being assigned to a cathode 7-10 is connected to an electrical line 63 which connects each of the anodes 28-32. A pull-down resistor 34 is connected to the line 63 at its one end and to ground 33 at its other end. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009191363(A) 申请公布日期 2009.08.27
申请号 JP20090020111 申请日期 2009.01.30
申请人 APPLIED MATERIALS INC 发明人 HANIKA MARKUS;STOLLEY TOBIAS
分类号 C23C14/34;H01L21/31 主分类号 C23C14/34
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