发明名称 PHOTOSENSITIVE ELEMENT
摘要 Disclosed is a photosensitive element (1) comprising a supporting film (10) and a layer (photosensitive layer) (20) which is formed on the supporting film (10) and composed of a photosensitive resin composition. The supporting film (10) has a haze of 0.01-2.0%, and the total number of particles and agglomerates having a diameter of 5 mum or more contained in the supporting film (10) is not more than 5 pieces/mm2. The photosensitive layer (20) contains a binder polymer (A), a photopolymerizable compound (B) having an ethylenically unsaturated bond, and a photopolymerization initiator (C), and has a thickness of 3-30 mum. ® KIPO & WIPO 2009
申请公布号 KR20090091323(A) 申请公布日期 2009.08.27
申请号 KR20097014247 申请日期 2008.01.28
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 KUBOTA MASAO;TAKANO SHINJI;YAMADA EIICHIROU
分类号 G03F7/09;G03F7/028 主分类号 G03F7/09
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