| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a resist pattern having a residual film value with a desired thickness regardless of a pattern figure in a translucent region. <P>SOLUTION: A multilevel grayscale photomask includes, on a transparent substrate 21, a light shielding region A, a first translucent region B (dark translucent region), a second translucent region C (bright translucent region) and a light transmitting region D. The first translucent region B is a pattern having a large region, while the second translucent region C is a pattern having a small width. The first translucent region B and the second translucent region C have approximately the same effective transmittance to exposure light. <P>COPYRIGHT: (C)2009,JPO&INPIT |
