A process for limiting the growth of microorganisms comprises (a) providing an antimicrobial agent comprising fine-nanoscale gold on a support medium comprising nanoparticulate titania, the fine-nanoscale gold having been deposited on the support medium by physical vapor deposition; and (b) contacting at least one microorganism with the antimicrobial agent.
申请公布号
WO2009046081(A3)
申请公布日期
2009.08.27
申请号
WO2008US78413
申请日期
2008.10.01
申请人
3M INNOVATIVE PROPERTIES COMPANY;KSHIRSAGAR, MANJIRI T.;KSHIRSAGAR, TUSHAR A.;WOOD, THOMAS E.
发明人
KSHIRSAGAR, MANJIRI T.;KSHIRSAGAR, TUSHAR A.;WOOD, THOMAS E.