| 发明名称 |
CLEANING LIQUID, CLEANING METHOD, LIQUID GENERATING APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<p>In an exposure apparatus, a substrate is exposed to an exposure beam through an exposure liquid. A cleaning liquid is supplied to the exposure apparatus for cleaning at least a part of the exposure apparatus. In the cleaning liquid, a prescribed gas is dissolved at a saturating concentration or more. ® KIPO & WIPO 2009</p> |
| 申请公布号 |
KR20090091317(A) |
申请公布日期 |
2009.08.27 |
| 申请号 |
KR20097013736 |
申请日期 |
2007.12.04 |
| 申请人 |
NIKON CORPORATION;KURITA WATER INDUSTRIES LTD. |
发明人 |
NAGASAKA HIROYUKI;MORITA HIROSHI;TOKOSHIMA HIROTO |
| 分类号 |
G03F7/42;G03F7/20 |
主分类号 |
G03F7/42 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
