| 发明名称 |
NOVEL COMPOUND, PREPARATION METHOD THEREOF, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a compound useful as an acid generator for a resist composition, a compound useful as a precursor for the compound, an acid generator, a resist composition and a method for forming a resist pattern. <P>SOLUTION: The resist composition comprises a substrate component (A) of which solubility to an alkaline developer is modified by action of an acid and an acid generator component (B) which generates an acid upon exposure to light, provided that the acid generator component (B) comprises an acid generator (B1) comprising a compound represented by structural formula (b1-2). <P>COPYRIGHT: (C)2009,JPO&INPIT |
| 申请公布号 |
JP2009191054(A) |
申请公布日期 |
2009.08.27 |
| 申请号 |
JP20080036732 |
申请日期 |
2008.02.18 |
| 申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
KAWAKAMI AKINARI;ISHIZUKA KEITA;MATSUZAWA KENSUKE;UTSUMI YOSHIYUKI;SHIMIZU HIROAKI |
| 分类号 |
C07D307/93;C07C69/54;C07C69/708;G03F7/004;G03F7/039 |
主分类号 |
C07D307/93 |
| 代理机构 |
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| 主权项 |
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