发明名称 |
ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, METHOD FOR MANUFACTURING UNEVEN PATTERN CARRYING SUBSTRATE, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM |
摘要 |
When performing writing on a substrate applied with a resist by rapidly vibrating electron beam in a direction orthogonal to a radial direction of the substrate and X-Y deflecting the electron beam while rotating the substrate in one direction, a long element is written by scanning the electron beam with the middle position of a 2-bit signal length as the center position of the electron beam so as to completely fill the area of the writing length reduced by a predetermined ratio and an unwritten portion of predetermined width remaining on each side of the long element with respect to a final 2-bit signal length on a magnetic disk medium.
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申请公布号 |
US2009212230(A1) |
申请公布日期 |
2009.08.27 |
申请号 |
US20090393117 |
申请日期 |
2009.02.26 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
USA TOSHIHIRO;KOMATSU KAZUNORI |
分类号 |
H01J3/14;G01Q10/04 |
主分类号 |
H01J3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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