| 发明名称 |
CHAIN SCISSION POLYESTER POLYMERS FOR PHOTORESISTS |
| 摘要 |
<p>Polymers for extreme ultraviolet and 193 nm photoresists are disclosed. The polymers comprise a photoacid generator (PAG) residue, an acid cleavable residue and a diacid joined by ester linkages. The polymers include a photoacid generating diol, a diacid and an acid lable diol.</p> |
| 申请公布号 |
WO2009105667(A2) |
申请公布日期 |
2009.08.27 |
| 申请号 |
WO2009US34707 |
申请日期 |
2009.02.20 |
| 申请人 |
THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK;BRAINARD, ROBERT L.;REVURU, SRIVIDYA |
发明人 |
BRAINARD, ROBERT L.;REVURU, SRIVIDYA |
| 分类号 |
C08G63/91 |
主分类号 |
C08G63/91 |
| 代理机构 |
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