| 摘要 |
PROBLEM TO BE SOLVED: To solve the problems that a conventional detergent for a copper wire semiconductor has insufficient effects of removing organic residuals derived from abrasives attaching to a copper wire and a metallic wire material (such as copper and tungsten) is corroded. SOLUTION: A detergent for the copper wire semiconductor contains organic amine (A), at least one of polyvalent-hydroxyl-group-containing compounds (B) selected from a group including (I) to (IV) as shown below, and water (W), and has pH of 2-14 at 25°C: where (I) refers to a polyvalent-hydroxyl-group-containing carbon hydride with a molecular weight less than 1,000; (II) refers to polyvalent-hydroxyl-group-containing carbon hydride having at least one functional group selected from a group including an ether group, an ester group, a formyl group, a sulfo group, a sulfonyl group, a phosphono group, a thiol group, a nitro group and an amide group with a molecular weight lower than 1,000; (III) refers to a polyvalent-hydroxyl-group-containing compound having a molecular structure with the dehydrated and condensed carbon hydride (I) and (II); (IV) refers to saccharide; and (V) refers to polyvinyl alcohol which may have been denaturalized. COPYRIGHT: (C)2009,JPO&INPIT
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