发明名称 ELECTRON BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To obtain an interference microscope image of a multi-stage electron beam biprism by an electromagnetic lens system with the same number as the one-stage electron beam biprism without drop of operation flexibility of the multi-stage electron beam biprism. SOLUTION: An upper-stage electron beam biprism is arranged at further upstream side in a progress direction of an electron beam than a specimen, and an image of the electron beam biprism is formed on the specimen (on an object plane) with the use of an imaging action of an upstream side magnetic field of an objective lens. Then, a double-biprism interference optical system is constructed of a lower-stage electron beam biprism arranged downstream side of the objective lens up to the first image plane of the specimen. No new electromagnetic lens needs to be added in this optical system. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009193834(A) 申请公布日期 2009.08.27
申请号 JP20080033948 申请日期 2008.02.15
申请人 HITACHI LTD 发明人 HARADA KEN;KASAI HIROTO
分类号 H01J37/295;H01J37/26 主分类号 H01J37/295
代理机构 代理人
主权项
地址