| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface inspection device capable of detecting easily a large-scale defect of a wafer. SOLUTION: This surface inspection device 1 is equipped with an illumination optical system 20 for irradiating the surface of a wafer 10 with an illumination light; an imaging optical system 30 for imaging the surface of the wafer 10 irradiated with the illumination light; an image processing part 41 for performing image processing for lowering a resolution to an image of the wafer 10 imaged by the imaging optical system 30, and inspecting existence of a defect of the wafer 10; and an image display device 42 for displaying the image of the wafer 10 whose resolution is lowered by the image processing part 41. COPYRIGHT: (C)2009,JPO&INPIT
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