发明名称 |
DEFECT INSPECTION METHOD AND APPARATUS |
摘要 |
A method of inspecting patterns, including: adjusting a brightness of at least one of a first bright field image and a second bright field image detected from a specimen and directed to similar patterns on differing parts of the specimen, so as to more closely match a brightness; comparing the images which are adjusted in brightness to match with each other to detect dissimilarities indicative of a defect of the pattern, wherein in adjusting the brightness, the brightness between the first bright field image and the second bright field image is adjusted by performing a gradation conversion of at least one of the brightness between the first bright field image and the second bright field image; and wherein in the comparing, said defect of the pattern is detected by using information of a scattered diagram of brightness of the first bright field image and the second bright field image.
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申请公布号 |
US2009214102(A1) |
申请公布日期 |
2009.08.27 |
申请号 |
US20090359452 |
申请日期 |
2009.01.26 |
申请人 |
MAEDA SHUNJI;OKA KENJI;SHIBATA YUKIHIRO;YOSHIDA MINORU;SHISHIDO CHIE;TAKAGI YUJI;YOSHIDA ATSUSHI;YAMAGUCHI KAZUO |
发明人 |
MAEDA SHUNJI;OKA KENJI;SHIBATA YUKIHIRO;YOSHIDA MINORU;SHISHIDO CHIE;TAKAGI YUJI;YOSHIDA ATSUSHI;YAMAGUCHI KAZUO |
分类号 |
G06K9/00;G01N21/95;G01N21/956;G06T7/00 |
主分类号 |
G06K9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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