发明名称 NEGATIVE RADIATION-SENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a negative radiation-sensitive resin composition which can suppress indentation of a resist pattern and resist cracking by plating stress at a plating step and accurately form thick platings, even when descumming (O<SB>2</SB>plasma ashing) treatment is performed as pretreatment for plating, and which is excellent in resolution and adhesion. <P>SOLUTION: The negative radiation-sensitive resin composition comprises (A) a copolymer having a specific structural unit, (B) a crosslinking agent comprising (b1) a compound having a structural unit of formula (3) or (b2) a compound of formula (4), (C) a radiation-sensitive radical polymerization initiator, and (D) an organic solvent. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009192613(A) 申请公布日期 2009.08.27
申请号 JP20080030558 申请日期 2008.02.12
申请人 JSR CORP 发明人 NISHIKAWA KOJI;ONIMARU NAMI;SAKO AKARI
分类号 G03F7/033;G03F7/027;G03F7/40;H01L21/027 主分类号 G03F7/033
代理机构 代理人
主权项
地址