发明名称 |
METHOD FOR MANUFACTURING PROBE SUPPORTING PLATE, COMPUTER STORAGE MEDIUM AND PROBE SUPPORTING PLATE |
摘要 |
<p>A prescribed pattern is formed on a thin metal plate by photolithography. The thin metal plate is etched by using the pattern as a mask, and a plurality of through holes each of which has a diameter larger than that of a probe are formed on the thin metal plate. Such etching is performed to a plurality of the thin metal plates. After removing the pattern, the thin metal plates are laminated by having each through hole of each thin metal plate along a guide pin of a guide. The laminated thin metal plates are bonded by diffusion bonding. An insulating film is formed on a surface of the thin metal plate and on an inner surface of each through hole. The thickness of the insulating film is adjusted so that the inner diameter of the through hole whereupon the insulating film is formed matches with the diameter of the probe.</p> |
申请公布号 |
WO2009104589(A1) |
申请公布日期 |
2009.08.27 |
申请号 |
WO2009JP52666 |
申请日期 |
2009.02.17 |
申请人 |
TOKYO ELECTRON LIMITED;MOCHIZUKI, JUN;TAKASE, SHINICHIRO |
发明人 |
MOCHIZUKI, JUN;TAKASE, SHINICHIRO |
分类号 |
G01R1/073 |
主分类号 |
G01R1/073 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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