发明名称 METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE SUBSTRATE
摘要 <p>Disclosed is a method for producing a transparent conductive substrate, by which there can be easily produced a transparent conductive substrate having good conductivity and transparency and comprising a titanium oxide transparent conductive film which is patterned into a desired shape. In this method, a precursor liquid for forming a titanium oxide transparent conductive film is applied onto a transparent substrate and dried at a temperature not more than 350°C, and the thus-obtained coating film is subjected to etching and then to annealing. The precursor liquid for forming a titanium oxide transparent conductive film preferably contains (A) a reaction product obtained by reacting a titanium compound with hydrogen peroxide and (B) a reaction product obtained by reacting a tantalum compound with hydrogen peroxide.</p>
申请公布号 WO2009104695(A1) 申请公布日期 2009.08.27
申请号 WO2009JP52927 申请日期 2009.02.19
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED;NAKATA, KUNIHIKO;SUGAWARA, KENICHIRO 发明人 NAKATA, KUNIHIKO;SUGAWARA, KENICHIRO
分类号 H01B13/00;B05D5/12 主分类号 H01B13/00
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