发明名称 METHOD AND STRUCTURE FOR REMOVAL OF FLOATING IMPURITIES
摘要 FIELD: technological processes, filters. ^ SUBSTANCE: invention is intended for treatment of sewage waters. Installation comprises the following components: reservoir N with liquid, the first surface groove 2a with overflow device 2a1, outlet unit P for floating impurities and the second surface groove 2c for removal of cleaned liquid. Floating impurities in continuous flow are poured in two subsequent stages: first in primary volume I, then - in secondary volume II. Floating impurities from primary volume I into secondary volume II are poured in controlled manner by means of liquid level h1 control in primary volume by unit 2a2 for flow balancing and/or by means of control device application that is installed in wall separating primary volume I and secondary volume II. It helps to separate floating impurities from liquid phase and their removal from reservoir. Cleaned water is removed by means of the second surface groove 2c. ^ EFFECT: simplification of device design, improvement of process of floating impurities separation from liquid phase. ^ 7 cl, 7 dwg
申请公布号 RU2365400(C2) 申请公布日期 2009.08.27
申请号 RU20070102214 申请日期 2005.02.28
申请人 FINNKEHT'JU INVEST OJ 发明人 TUOMIKOSKI PEKKA
分类号 B01D;B01D21/20;B01D21/24;C02F1/40 主分类号 B01D
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