| 摘要 |
<P>PROBLEM TO BE SOLVED: To protect at least a part of the surface of a lithographic apparatus from the effect of DUV radiation. <P>SOLUTION: Disclosed is a coating which can be used for an apparatus having a radiation source, for example, a lithographic apparatus. The coating contains elements of Si, O, and F and optionally contains C and H. An article is also disclosed. The article may be selected from a group composed of a substrate table, an optical element, a shutter member, a sensor, a projection system, and a containment structure. At least a part of the surface of the article is covered with a coating. The coating contains elements of Si, O, and F and optionally contains C and H. The coating may contain elements of Si, O, C, and H. <P>COPYRIGHT: (C)2009,JPO&INPIT |
