| 摘要 |
<p>Provided are 1) polymer compounds having excellent acid reactivity and thermal stability as well as minimal swelling during development, 2) compounds of the following formula that serve as starting materials for said polymer compounds, and 3) photoresist compositions that comprise said polymer compounds in which the LWR has been improved and that have excellent heat resistance. (In the formula, n represents an integer of 0 to 2, R1 represents a hydrogen atom, methyl group, etc., each of R2 to R10 independently represents a hydrogen atom, straight-chain alkyl group, branched alkyl group, etc., and each of A and B independently represents an oxygen atom or a sulfur atom.)</p> |
