| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an observation apparatus capable of observing or measuring an object in a wide range by employing a wavefront aberration adapting technique. <P>SOLUTION: The observation apparatus 1 includes a light source 10, a biaxial scanning system 20, a wavefront modulator 30, an optical branching part 40, an optical detector 50, a wavefront detector 60, a controller 70, etc. The wavefront modulator 30 presents a compensation phase pattern for compensating aberration of input light and also a branching phase pattern for branching the input light to a first and a second light. The wavefront detector 60 receives the input light to detect the wavefront of the light. In a loop processing including detection of wavefront distortion of light by the wavefront detector 60, phase pattern adjustment by the controller 70 based on this detection result, and the presentation of the phase pattern by the wavefront modulator 30, the compensation phase pattern for compensating wavefront aberration is feedback-controlled. <P>COPYRIGHT: (C)2009,JPO&INPIT |
