| 摘要 |
PROBLEM TO BE SOLVED: To provide a vaporizer that can restrain the deterioration of a medical solution, has high vaporization efficiency, and can reduce the flow rate of a carrier gas, to provide a substrate processing apparatus employing the vaporizer to reduce the risk of leakage of a vaporized processed gas, and to provide a substrate processing method. SOLUTION: A number of groove sections 36 are formed on the surface of a vaporization plate 31, an HMDS liquid that is a chemical solution is spread onto a vaporization surface by a capillary phenomenon via the groove sections 36, and the carrier gas is supplied onto the vaporization surface in this state to vaporize the HMDS liquid and to obtain a processed gas. When no vaporization is performed, a stored HMDS liquid does not come into contact with the carrier gas, thus restraining the deterioration of the HMDS liquid. Also, the vaporizer can be miniaturized and vaporization efficiency is high, thus reducing the amount of carrier gas. Since the vaporizer 3 can be miniaturized, it can be placed at the side of a processing container 22, thus reducing or eliminating the piping of the processed gas and hence restraining the leakage of the processed gas. COPYRIGHT: (C)2009,JPO&INPIT
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