| 摘要 |
PROBLEM TO BE SOLVED: To provide a deposition apparatus capable of greatly improving the throughput both by suppressing the deposition of an unnecessarily attached film on a sidewall of a treating vessel to reduce the frequency of cleaning of the apparatus and by shortening the cleaning time to improve the use efficiency of the apparatus. SOLUTION: The deposition apparatus for forming a polymer thin film on the surface of a workpiece W includes: a treating vessel 4 housing the workpiece; a holding means 6 for holding the workpiece in the treating vessel; a vacuum-exhausting system 30 for vacuuming the inside of the treating vessel; a gas supplying means 20 for supplying a plurality of raw material gasses for a polymer thin film into the treating vessel; a vessel heating means 14 for heating the treating vessel; an inside cooling means 40 for cooling the holding means; and a temperature controlling part 62 for controlling so that a difference in the temperature between the sidewall of the treating vessel and the holding means becomes a predetermined temperature difference or more. By this deposition apparatus, the deposition of an unnecessarily attached film on the sidewall of the treating vessel is suppressed. COPYRIGHT: (C)2009,JPO&INPIT
|
