发明名称 THIN FILM TRANSISTOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a thin film transistor transparent with respect to visible light in which the unevenness of a gate electrode surface which causes the deterioration of characteristics is suppressed, and its manufacturing method. SOLUTION: The thin film transistor is a bottom gate type thin film transistor at least composed of a substrate, a gate electrode, a gate insulating layer, a semiconductor layer, a source electrode, and a drain electrode. All members constituting the transistor are transparent with respect to visible light, and at a boundary between the gate electrode and the gate insulating layer a difference between a recessed part and a protruded part in a perpendicular direction of the boundary surface is 30 nm or smaller. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009194351(A) 申请公布日期 2009.08.27
申请号 JP20080083386 申请日期 2008.03.27
申请人 CANON INC 发明人 TAKAHASHI KENJI;HAYASHI SUSUMU;SANO MASAFUMI
分类号 H01L29/786;H01L21/28;H01L21/336;H01L29/417;H01L29/423;H01L29/49 主分类号 H01L29/786
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