发明名称 ELECTRON BEAM GENERATING APPARATUS
摘要 An electron beam generating apparatus (1a) includes an electron gun (2), a vacuum container (3), a frame material (11), and a window material (13). The electron gun (2) has a filament (7) from which an electron beam (EB) is emitted. The vacuum container (3) holds the filament (7). The frame material (11) has an electron passing hole (11c) through which the electron beam (EB) passes, and is detachably attached to the vacuum container (3). The window material (13) is bonded (brazed) to the frame material (11) so as to airtightly stop up the electron passing hole (11c), and allows the electron beam (EB) to penetrate therethrough.
申请公布号 US2009212681(A1) 申请公布日期 2009.08.27
申请号 US20070281713 申请日期 2007.02.08
申请人 HAMAMATSU PHOTONICS K.K. 发明人 MATSUMURA TATSUYA
分类号 H01J33/04 主分类号 H01J33/04
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