PATTERNING OF NANOSTRUCTURES,申请号WO2009SG00064-传众专利搜索

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发明名称	PATTERNING OF NANOSTRUCTURES
摘要	<p>A method of patterning nanostructures comprising printing an ink comprising the nanostructures onto a solvent-extracting first surface such that a pattern of nanostructures is formed on the first surface.</p>
申请公布号	WO2009105045(A1)	申请公布日期	2009.08.27
申请号	WO2009SG00064	申请日期	2009.02.23
申请人	NANYANG TECHNOLOGICAL UNIVERSITY;BHUPENDRA, KUMAR;ZHANG,YUANYUAN;WANG, ZONGBIN;LI, LAIN-JONG;MHAISALKAR, SUBODH, GAUTAM	发明人	BHUPENDRA, KUMAR;ZHANG,YUANYUAN;WANG, ZONGBIN;LI, LAIN-JONG;MHAISALKAR, SUBODH, GAUTAM
分类号	B41C1/10;B41C1/06;B41N1/14;B82B3/00;C09D11/02;C09D11/10;G03F7/00;H01L21/02;H01L51/40	主分类号	B41C1/10
代理机构		代理人
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