SUBSTRATE CLEANING APPARATUS WITH TILTED PLASMA

摘要

PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus for efficiently cleaning a cleaned place by obliquely irradiating a substrate with Helicon wave plasma. SOLUTION: In a plasma asher which introduces oxygen and steam into the evacuated vacuum chamber to generate the plasma at high frequency and peels resist off the substrate held horizontally, the substrate cleaning apparatus is characterized by obliquely irradiating the substrate with plasma by tilting an evacuated vacuum chamber. COPYRIGHT: (C)2009,JPO&INPIT