发明名称 VCSEL WITH REDUCED LIGHT SCATTERING WITHIN OPTICAL CAVITY
摘要 A VCSEL with a structure able to reduce the scattering within the optical cavity and its manufacturing method are disclosed. The VCSEL of the present invention provides, on the semiconductor substrate, the first DBR, the active layer, the p-type spacer layer, the heavily doped p-type mesa, the heavily doped n-type layer, the first n-type spacer and the second DBR in this order. The heavily doped n-type layer, which is formed so as to cover the p-type spacer layer and the heavily doped p-type mesa, forms the tunnel junction with respect to the heavily doped p-type mesa. Because the height, which is appeared in the surface of the n-type spacer layer, reflects the height of the heavily doped p-type mesa and is comparatively small, the light scattering between the second DBR and the n-type spacer layer is suppressed.
申请公布号 US2009213892(A1) 申请公布日期 2009.08.27
申请号 US20090392410 申请日期 2009.02.25
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 ONISHI YUTAKA
分类号 H01S5/125;H01L21/20 主分类号 H01S5/125
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