| 摘要 |
A trivalent chromium-based electroplating solution in accordance with the present invention a trivalent chromium salt, a bivalent nickel salt, a complex agent, a conductive salt, a buffering agent and an additive for electroplating a chromium-nickel alloy deposit on a component. By using the lowly toxic trivalent chromium to substitute highly toxic hexavalent chromium, an electroplating procedure with the present trivalent chromium-based electroplating solution has less pollution and high current efficiency to allow the electroplating performing at the room temperature.
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