| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an optical unit capable of contributing to the equalization of illumination distribution of light to be emitted, and to provide an illumination optical system, an exposure apparatus and a device manufacturing method. <P>SOLUTION: A first optical unit 19 is provided on a light path of an exposure light EL output from an exposure light source. The first optical unit 19 includes a pair of micro-fly eye lenses 30, 31 disposed along the light path of the exposure light EL, and a plurality of lens planes 32, 33 formed in a Y-direction are formed on the surfaces of emission side of each of the micro-fly eye lenses 30, 31. Non-lens regions 34, 35 are formed between the lens planes 32, 33 adjacent to each other in the Y-direction. A plurality of light-shielding wire materials 40 disposed so as to abut to each of non-lens regions 35 are provided on the emission side of the micro-fly eye lens 31, and each light-shielding wire materials 40 shields the exposure light EL emitted from each non-lens region 35 individually corresponding thereto. <P>COPYRIGHT: (C)2009,JPO&INPIT |
