发明名称 |
WAVEFRONT ABERRATION MEASURING METHOD, MASK, WAVEFRONT ABERRATION MEASURING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD |
摘要 |
A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining diffraction gratings each ruled with lines oriented in a direction different from the other; an illumination optical system that illuminates an area of the mask with light emitted from a light source; a light splitter that splits the light from the pattern transmitted through the to-be-tested optical system; an image pickup unit that takes an image of interference fringes produced by the split light, the image being used in measuring wavefront aberration of the to-be-tested optical system; a detector that detects respective light quantities of respective diffracted beams from the respective illuminated diffraction gratings; and a control unit that controls alignment of the illuminated area of the mask and the pattern in accordance with a detection result.
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申请公布号 |
US2009213389(A1) |
申请公布日期 |
2009.08.27 |
申请号 |
US20090391918 |
申请日期 |
2009.02.24 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
OUCHI CHIDANE;HASEGAWA MASANOBU;KATO SEIMA |
分类号 |
G01B9/02;G01M11/02;G03F1/24;G03F1/44;G03F1/70;G03F7/20;H01L21/027 |
主分类号 |
G01B9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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