| 发明名称 |
METHOD OF APPLYING A PATTERN OF METAL, METAL OXIDE AND/OR SEMICONDUCTOR MATERIAL ON A SUBSTRATE |
| 摘要 |
The present application relates to a method of applying a pattern of metal, metal oxide and/or semiconductor material on a substrate, to a pattern created by such method and to uses of such pattern. Furthermore, the present invention relates to an assembly of layers that can be used for printing.
|
| 申请公布号 |
US2009214838(A1) |
申请公布日期 |
2009.08.27 |
| 申请号 |
US20080341293 |
申请日期 |
2008.12.22 |
| 申请人 |
SONY CORPORATION |
发明人 |
LUSSEM BJORN;KARIPIDOU ZOI;WESSELS JURINA;YASUDA AKIO |
| 分类号 |
B32B7/04;B32B37/02;B44C1/22 |
主分类号 |
B32B7/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
