发明名称 MOVABLE SUPPORT, POSITION CONTROL SYSTEM, LITHOGRAPHIC APPARATUS, AND METHOD OF CONTROLLING POSITION OF EXCHANGEABLE OBJECT
摘要 <P>PROBLEM TO BE SOLVED: To improve the positioning accuracy and/or settling time of a substrate supported by a movable support or an exchangeable object such as a patterning device. <P>SOLUTION: The movable support is configured to hold the exchangeable object. The support includes a movable structure configured to be movable relative to a reference object, an object holder configured to be movable relative to the movable structure and hold the exchangeable object, an actuator configured to move the movable structure relative to the reference object, and a minimum stroke actuator configured to move the object holder relative to the movable structure. The stiffness of the minimum stroke actuator is substantially larger than at least a degree of stiffness of the actuator. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009194384(A) 申请公布日期 2009.08.27
申请号 JP20090024480 申请日期 2009.02.05
申请人 ASML NETHERLANDS BV 发明人 BUTLER HANS
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址