Projection exposure system for use in microlithography for production of semiconductor components, has optical element statically deformable by force effect, where electrostatic force field acts between subelements of optical element

摘要

The system (10) has an arrangement (28) of optical elements (30, 32, 34) in which the optical element (34) is statically deformable by a force effect for image defect correction, where the force effect is caused by an electrostatic force field. The element has a subelement e.g. lens, that is placed at a distance from another subelement e.g. transmissive pellicle. The force field acts between the subelements. The latter subelement is subjected with electrically inhomogeneous charge distribution and the former subelement is subjected with homogeneous charge distribution.