| 摘要 |
A measurement method and a reticle are provided to precisely measure the wave front aberration of projection optical system by enlarging the measurement area. A pin hole(130) makes a mark(110) for measuring the wave front and the light from the mark for measuring the wave front to be incident in the different locations on the pupil plane of optical system. The reticle for measurement is arranged to the object plane of the optical system. The image of the mark for measurement is formed on the image plane of optical system. The wave front aberration of optical system is calculated based on the spatial deviation value formed on the image plane of optical system. The mark for measuring the wave front includes the first mark(112) and the second mark(114). |
