| 摘要 |
A particle inspection apparatus (3) includes irradiation means (37) configured to apply a light beam onto front and back surfaces of an object to be inspected, first and second detection means (19a, 19b) configured to detect scattering light from the surfaces, calculation means (35) configured to conduct a particle inspection on the surfaces on the basis of outputs from the detection means, and control means (36) configured to control the irradiation means, the detection means, and the calculation means. The irradiation means selectively applies the beam onto the front or back surface. The control means causes the calculation means to conduct the inspection on the inspection surface on which the light beam is selectively applied, on the basis of outputs from the detection means corresponding to simultaneous application and selective application of the light beam. |
