| 摘要 |
The operation of determining the height difference between a first reference point (H) and a second reference point (S), wherein at least one of the two reference points (H, S) is located on a semiconductor chip (8) that is mounted on a substrate (7), involves the following steps: A) a first image is recorded from a first direction (2) which runs obliquely at a predetermined angle alpha2 to the surface of the substrate, wherein the substrate and the semiconductor chip are illuminated from a second direction (3) which runs obliquely at a predetermined angle alpha3 to the surface of the substrate, B) a second image is recorded from the second direction, wherein the substrate and the semiconductor chip are illuminated from the first direction, C) a first distance between the reference point S and the reference point H in the first image is determined, D) a second distance between the reference point S and the reference point H in the second image is determined, and E) the height difference is calculated from the first distance and the second distance. ® KIPO & WIPO 2009
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