METHOD FOR FORMING SILICA FILM

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a dense silica film by a simple operation without thermally affecting a substrate in a short time. SOLUTION: The problems can be solved by using a method for forming a silica film 4 which is characterized by comprising a step of forming a polysilazane containing film 3 on the surface 1a of a substrate 1 and a step of converting the polysilazane containing film 3 into a silica film 4 by spraying a carrier gas P which has passed through an atmospheric pressure plasma region. COPYRIGHT: (C)2009,JPO&INPIT