发明名称 |
NOVEL COMPOUND AND METHOD OF PRODUCING SAME, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN |
摘要 |
A resist composition including a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) consisting of a compound represented by general formula (b1-2) shown below: <?in-line-formulae description="In-line Formulae" end="lead"?>[Chemical Formula 1]<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>A+Z- (b1-2)<?in-line-formulae description="In-line Formulae" end="tail"?> wherein A+ represents an organic cation; and Z- represents an anionic cyclic group, wherein the cyclic group includes an ester linkage within the ring structure, two mutually different groups are bonded to the ring structure, one of these groups includes an ester linkage in which a carbon atom that constitutes part of the ester linkage is bonded directly to the ring structure, and the other group includes an anion moiety.
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申请公布号 |
US2009208871(A1) |
申请公布日期 |
2009.08.20 |
申请号 |
US20090371876 |
申请日期 |
2009.02.16 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
KAWAUE AKIYA;ISHIDUKA KEITA;MATSUZAWA KENSUKE;UTSUMI YOSHIYUKI;SHIMIZU HIROAKI |
分类号 |
G03F7/20;C07D307/77;G03F7/004 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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