| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which ensures a good pattern profile and good line edge roughness in normal exposure (dry exposure) and immersion exposure, a pattern forming method using the positive photosensitive composition, and to provide a compound used for the positive photosensitive composition. <P>SOLUTION: The positive photosensitive composition includes (A) a resin (A-1) which has a repeating unit having a group represented by formula (I) and of which the solubility in an alkali developer increases by the action of an acid and a resin (A-2) of which the solubility in an alkali developer increases by the action of an acid, and (B) a compound which generates an acid upon irradiation with actinic rays or radiation, wherein R<SB>1</SB>and R<SB>2</SB>represent a monovalent organic group, R<SB>1</SB>and R<SB>2</SB>may be the same or different and may bond to each other to form a cyclic structure; R<SB>3</SB>-R<SB>6</SB>represent a hydrogen atom or a monovalent organic group, R<SB>3</SB>-R<SB>6</SB>may be the same or different and may bond to each other to form a cyclic structure; L<SB>0</SB>represents a (p+1)-valent linking group; m and n represent an integer of 0-5, provided that m+n≥3; and p represents an integer of 1-3. <P>COPYRIGHT: (C)2009,JPO&INPIT |
