| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma CVD apparatus capable of enhancing a film thickness uniformity and a step coverage. SOLUTION: In the plasma CVD apparatus, organic raw material gas having monomer is polymerized by plasma and film-deposited on a base material 3. The plasma CVD apparatus includes a vacuum vessel 1, a holding electrode 2 which is arranged in the vacuum vessel 1 and capable of holding the base material 3 with the electric potential of the base material 3 being float, a ring electrode 4 which is arranged in the vacuum vessel 1 and arranged opposite to the base material 3 held by the holding electrode 2, and a high frequency power source electrically connected to the ring electrode 4. COPYRIGHT: (C)2009,JPO&INPIT
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